Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS

Hervé Martinez (1) , Anas Benayad (2) , Danielle Gonbeau (1) , Philippe Vinatier (2) , Brigitte Pecquenard (2) , Alain Levasseur (2)

1 LCTPCM - Laboratoire de Chimie théorique et Physico-chimie moléculaire
2 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux

Keywords: Tungsten oxysulfide; Titanium oxysulfide; Thin films; XPS; Core peaks; Valence bands; Density of states

Domains: Material chemistry

Hervé Martinez, Anas Benayad, Danielle Gonbeau, Philippe Vinatier, Brigitte Pecquenard, et al.. Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS. Applied Surface Science, 2004, 236 (1-4), pp.377-386. ⟨10.1016/j.apsusc.2004.05.010⟩. ⟨hal-00150342⟩