Amorphous oxysulfide thin films MOySz (M = W, Mo, Ti) XPS characterization: Structural and electronic pecularities

Jean-Charles Dupin (1) , Danielle Gonbeau (1) , Isabelle Martin-Litas (2) , Philippe Vinatier (2) , Alain Levasseur (2)

1 IPREM - Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux
2 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux

The present paper reports the XPS study of different amorphous oxysulfides thin films MOySz (M = W, Ti, Mo), prepared by radio frequency magnetron sputtering. It has been shown the coexistence of various environments and formal oxidation numbers for metal atoms. In addition, the observation of several types of sulfur ions has revealed the specific character of such amorphous layers. In order to precise the common features and the differences as a function of the nature of the metal atom, a comparison of the data for the three kinds of thin films has been done.

Domaines: Matériaux; Chimie inorganique

Jean-Charles Dupin, Danielle Gonbeau, Isabelle Martin-Litas, Philippe Vinatier, Alain Levasseur. Amorphous oxysulfide thin films MOySz (M = W, Mo, Ti) XPS characterization: Structural and electronic pecularities. Applied Surface Science, 2001, 173 (1-2), pp.140-150. ⟨10.1016/S0169-4332(00)00893-X⟩. ⟨hal-01636424⟩